PSL Particle Standards
Polystyrene latex reference particles are widely used for controlled optical inspection response work.
- Single-size references
- Multi-size spot configurations
- Tool-response checks
- Recipe and sensitivity development
PRODUCTS
Wafer reference standards built around the measurement task.
Configure particle material, nominal size, wafer type, deposition pattern, and application objective for inspection and metrology work.
CONFIGURATION LOGIC
Specify what the tool must demonstrate.
BSI Standards takes an engineering-first approach to reference wafer configuration. The useful starting point is the qualification or calibration objective, followed by inspection platform, wafer requirements, particle material and size, and deposition geometry.
| Variable | Typical inputs |
|---|---|
| Inspection system | Manufacturer, model, recipe/channel |
| Wafer | Diameter, substrate, surface/film |
| Particle | PSL, silica, nominal size or size set |
| Deposition | Full wafer, spot, multi-spot, custom layout |
| Objective | Calibration, verification, matching, qualification, documentation |
Silica Particle Standards
Silica-based reference configurations can support applications where material response or process relevance matters.
- Defined particle material
- Application-specific sizing
- Spot or broader deposition options
- Engineering review before build
Deposition Formats
Choose a geometry that makes the measurement easier to interpret and repeat.
- Full-wafer deposition
- Single reference spot
- Multiple locations / size sets
- Custom patterned layouts
Need a nonstandard configuration?
Send the tool, wafer, particle and qualification objective for engineering review.